Glove Box System
Glove Box with ultra pure and dry N2 for work on Oxygen sensitive materials
UNF Devices & Tools
Reflectometer
Thickness measurement of transparent layers
Galina Chechelitsky | 02-6586127 | galinac@savion.huji.ac.il
Polymers Workbench
Workbench for Photo Lithography Development Processing
Galina Chechelitsky | 02-6586127 | galinac@savion.huji.ac.il
Polymers Workbench
Work Bench for work on Polymers
Galina Chechelitsky | 02-6586127 | galinac@savion.huji.ac.il
Thermal Evaporator
Thermal Evaporation of Chromium and Gold
Alexander Oginets | 02-6585249 | alexandero@savion.huji.ac.il
AML Wafer Bonder System
The only on the market capable of in-situ alignment, activation, and bonding.
Photo Lithography Development Bench
Workbench for Photo Lithography Development Processing
Inspection Microscope Nikon
Direct Laser Writing Lithography
Dr. Itzik Shweky | 02-6585249 | Itzhak.shweky@mail.huji.ac.il
E-Beam Development Bench
Workbench for Photoresist Spin Coating
Dr. Itzik Shweky | 02-6586127 | Itzhak.shweky@mail.huji.ac.il
Delta 8 Spinner Bench
Workbench for Photoresist Spin Coating
Galina Chechelitsky | 02-6586127 | galinac@savion.huji.ac.il
Mechanical Profilometer
Profile Scanning of Surfaces
Dr. Itzik Shweky | 02-6586127 | Itzhak.shweky@mail.huji.ac.il
Corial ICP/RIE System
Dry etching of Si, SiO2 and Si3N4