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Corial ICP/RIE System | Center for Nanoscience and Nanotechnology

Corial ICP/RIE System

corial

 

Manufacturer and model:

Corial ICP/RIE System, Corial, Corial 200I

General Information:

Dry etching of Si, SiO2 and Si3N4

Key Features:

  • Manually loaded ICP/RIE System 
  • Samples up to 200mm diameter
  • Laser End Point Detector
  • Chucks for 2"", 3"" and 4"" wafers

Applications:

Very precise and repeatable dry etching of  Si, SiO2 and Si3N4

Materials:

 Si, SiO2 and Si3N4

MANUFACTURER WEBSITE

Start of Operation Date:

April 2013