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Tube Furnaces | Center for Nanoscience and Nanotechnology

Tube Furnaces

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Tube

Manufacturer and model:

Oxidation / Annealing / Diffusion, Expertech CTR-125

General Information:

Oxidation / Annealing / Diffusion of Si wafers up to 100mm diameter

Key Features:

  • "Programable Stack of Furnaces
  • Temperatures up to 1100°C
  • Atmospheric Enviroments: N2, O2, N2/H2, DI Moisture"
     

Applications:

  • "Phosphorus Dopping using solid sources
  • Annealing of Aluminum deposited Si wafers
  • Dry Oxidation of up to 50 wafers  2"", 3"" or 4"" diameter
  • Wet Oxidation of up to 50 wafers  2"", 3"" or 4"" diameter"

Materials:

Si Wafers

Manufacturer Website

Start of Operation Date:

February 2011