RTA System

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Manufacturer and model:

RTA System, Annealsys, AS-Micro Double Chamber

General Information:

Rapid Thermal Annealing of Wafers and Dies

Key Features:

  • "Maximum Wafer Size: 3"" diameter
  • Number of Lamps / Maxium Power: 6 / 15 kW
  • Temperature: up to 1250°C
  • Temperature Measuring by Thermocouple and Pyrometer
  • Ramp Rate: from 0.1 to 250°C/sec
  • Annealing Enviroments: N2, O2, N2/H2, Vacuum"


  • "Superficial Annealing and Thermal Treatment of Samples
  • Shallow Thermal Diffusion"


Si, GaAs, Ge, SiO2, Al2O3

Manufacturer Website

Start of Operation Date:

july 2009