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Manufacturer and model:
Electronic Micro Systems, 1000-1 Precision Hot Plate
General Information:
Hot Plate for Photolithography Purposes
Key Features:
- Temperature up to 250°C
- Hot Plate Surface: 200mm x 200mm
- Temperature Homogenety: ±1% across working surface
- Vacuum Contact
- Temperature Ramps
- Stainless Steel Cover
Applications:
Pre and post backing of photoresist layers
Materials:
Si, SiO2, LiNbO3, Sapphire samples covered with different photoresists
Start of Operation Date:
June 2010