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Manufacturer and model:
Elionix, Japan. ELS-G100 Acessory
General Information:
High resolution, high speed e-beam lithography down to nanometers
Key Features:
Sub-micron registration
On-line coordinates transfer to Elionix E-Beam System
Applications:
- Pre-alignment for e-beam lithography processes
- General coordinates acquisition
- Sample dimensions measurements
Materials:
all kind of samples and different materials
Start of Operation Date:
Dec 2018