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Manufacturer and model:
AJA, ATC Polaris Series
General Information:
UHV Sputtering Layer Deposition
Key Features:
- 11 Sputtering Sources
- 2" Magnetron Sources
- Load-lock for 10 samples
- Sample size: up to 100mm diameter
- Base Pressure: 3 x 10-9 Torr (TMP + Cryo)
- RF and DC Power Sources
- Co-sputtering Capability
- Reactive Sputtering (N2 and O2)
- No Sample Cooling
- Sample Heating up to 1,000°C
- In-situ RGA Probe
Applications:
Deposition of high quality metallic and dieletric materials
Materials:
Al, Cu, Ti, Co, Ni, Fe, Pt, Pd, Au, Ta, Ru, Nb, Mg, Al2O3, Ni/Fe, Co/Fe, Co/Fe/B
Start of Operation Date:
Jan 2021