Manufacturer and model:
AML Wafer Bonder System, model AWB04,
General Information:
The only on the market capable of in-situ alignment, activation, and bonding. It allows in-situ alignment (including IR alignment) with 1µm accuracy on samples in the same chamber where bonding is performed.
Key Features:
- Unique In-situ alignment system (X,Y,Z & θ)
- Small chips, 2”, 3” and 4” wafers (with possibility for also 6” wafers)
- High Accuracy Optical Alignment even for small wafers sizes and chips
- 1 to 5µm Alignment Resolution
- Automatic Process
- Application of High Voltage, up to 2.5kV
- Platen temperatures up to 560°C
- Compression Forces up to 40,000N
- Typical Force Uniformity (pressure) better than +/-10% typical (5% over specific ranges), 2-sigma value
- Self-contained, Dry Vacuum Pumping System: vacuum down to 10-6 mbar range
- Plasma Assisted Process Capability
- Reactive Bonding Capability (H2O, N2/H2)
- Large Platen Separation (30mm)
- Forced Nitrogen Cooling
- Motorized chamber opening
Applications:
MEMS, MOEMS, Complex Packaging, 3D chip stacking and Silicon-on-Insulator (SOI) platforms but not only, because its broad list of specifications gives margin to many undreamed applications: anodic bonding, direct bonding, eutectic bonding, thermal pressing on materials like Pyrex, Silicon, GaAs and more
Materials:
Pyrex, Silicon, GaAs
Start of Operation Date:
May 2021