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Bonding Flexibility on Materials and Processes | Center for Nanoscience and Nanotechnology

Bonding Flexibility on Materials and Processes

AML Wafer Bonder System

Manufacturer and model:

AML Wafer Bonder System, model AWB04,

General Information:

The only on the market capable of in-situ alignment, activation, and bonding. It allows in-situ alignment (including IR alignment) with 1µm accuracy on samples in the same chamber where bonding is performed.

Key Features:

  • Unique In-situ alignment system (X,Y,Z & θ) 
  • Small chips, 2”, 3” and 4” wafers (with possibility for also 6” wafers) 
  • High Accuracy Optical Alignment even for small wafers sizes and chips 
  • 1 to 5µm Alignment Resolution
  • Automatic Process 
  • Application of High Voltage, up to 2.5kV 
  • Platen temperatures up to 560°C 
  • Compression Forces up to 40,000N 
  • Typical Force Uniformity (pressure) better than +/-10% typical (5% over specific ranges), 2-sigma value
  • Self-contained, Dry Vacuum Pumping System: vacuum down to 10-6 mbar range 
  • Plasma Assisted Process Capability
  • Reactive Bonding Capability (H2O, N2/H2)
  • Large Platen Separation (30mm) 
  • Forced Nitrogen Cooling 
  • Motorized chamber opening 

Applications:

MEMS, MOEMS, Complex Packaging, 3D chip stacking and Silicon-on-Insulator (SOI) platforms but not only, because its broad list of specifications gives margin to many undreamed applications: anodic bonding, direct bonding, eutectic bonding, thermal pressing on materials like Pyrex, Silicon, GaAs and more

Materials:

Pyrex, Silicon, GaAs

Manufacturer Website

Start of Operation Date:

May 2021