Manufacturer and model:
Corial ICP/RIE System, Corial, Corial 200I
General Information:
Dry etching of Si, SiO2 and Si3N4
Key Features:
- Manually loaded ICP/RIE System
- Samples up to 200mm diameter
- Laser End Point Detector
- Chucks for 2"", 3"" and 4"" wafers
Applications:
Very precise and repeatable dry etching of Si, SiO2 and Si3N4
Materials:
Si, SiO2 and Si3N4
Start of Operation Date:
April 2013