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Manufacturer and model:
Oxidation / Annealing / Diffusion, Expertech CTR-125
General Information:
Oxidation / Annealing / Diffusion of Si wafers up to 100mm diameter
Key Features:
- "Programable Stack of Furnaces
- Temperatures up to 1100°C
-
Atmospheric Enviroments: N2, O2, N2/H2, DI Moisture"
Applications:
- "Phosphorus Dopping using solid sources
- Annealing of Aluminum deposited Si wafers
- Dry Oxidation of up to 50 wafers 2"", 3"" or 4"" diameter
- Wet Oxidation of up to 50 wafers 2"", 3"" or 4"" diameter"
Materials:
Si Wafers
Start of Operation Date:
February 2011