ICP/RIE System

back to UNF devices & tools >>

Manufacturer and model:

Oxford Plasma Instruments 
Plasma Lab 100 

General Information:

 High-performance dry etching of a large range of materials

Key Features:

  • Wafers up to 150mm diameter
    load-lock operation
    end-point detector
    Chlorine and Fluorine Chemistry

Applications:

  • Deposition of conformal layers of dielectric materials from nanometers to microns thickness

Materials:

Si, SiO2, Si3N4, Sapphire, GaAs, InP, GaN, Al, Nb, ITO, Polymers

Manufacturer Website

Start of Operation Date:

2009