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Mask Aligner MA6 | Center for Nanoscience and Nanotechnology

Mask Aligner MA6

 

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Mask aligner

Manufacturer and model:

SUSS Microtec, Germany, MA6/BA6

General Information:

Traditional Mask Aligner System for Photolithography down to 1µm

Key Features:

Samples up to 100mm diameter

Masks up to 5" x 5" size

350W and 1000W UV Lamp House

Back Side Alignment

I-Line Filter

Applications:

Photolithography down to 1µm

Materials:

  • Wafers of all kind of materials up to 1mm thickness

Manufacturer Website

Start of Operation Date:

Jan 2007