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HOME / LINKS / THIN FILM PROCESS / Corial ICP/RIE System

Corial ICP/RIE System

Dry etching of Si, SiO2 and Si3N4

Maurice Saidian | 02-6585249 | maurice.saidian@mail.huji.ac.il

https://nano.huji.ac.il/corial-icprie-system

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The Hebrew University of Jerusalem
The Harvey M. Krueger Family Center
for Nanoscience and Nanotechnology
Edmond J. Safra Campus
Jerusalem 9190401, Israel

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+972-2-6586088
+972-2-6584919
HUJ-NANO@savion.huji.ac.il

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+972-2-6585719
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