ALD (Atomic Layer Deposition)

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Manufacturer and model:

ALD System Ultratech Savannah G2

General Information:

Atomic Layer Deposition System

Key Features:

  • Thermal ALD System Up to 6" samples
  • Temperature up to 350°C
  • Ozone source available 
  • Available inlets for more 3 precursors


High Quality deposition of Dielectric Layers like Al2O3, HfO3, TiO2



Manufacturer Website

Start of Operation Date:

 May 2016