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Manufacturer and model:
ALD System Ultratech Savannah G2
General Information:
Atomic Layer Deposition System
Key Features:
- Thermal ALD System Up to 6" samples
- Temperature up to 350°C
- Ozone source available
- Available inlets for more 3 precursors
Applications:
High Quality deposition of Dielectric Layers like Al2O3, HfO3, TiO2
Materials:
Al2O3
Start of Operation Date:
May 2016