Metal Oxide Growth within Homopolymers and Block Copolymers – Mechanism, Challenges and Opportunities

Date: 
Tue, 21/01/202011:00
Location: 
Seminar Hall, Los Angeles Building, entrance floor

Prof. Tamar Segal-Peretprof.bert_mz (Technion)

Inorganic Chemistry and Catalysis group, Debye Institute for Nanomaterials Science, Utrecht University, Universiteitsweg 99, 3584 CG Utrecht, The Netherlands

 

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Nanofabrication techniques have been the enabling tools for numerous developments in nanotechnology. Recently, a new technique, named sequential infiltration synthesis (SIS), has emerged from atomic layer deposition (ALD). Unlike thin film deposition of ALD, in SIS, the vapor-phase precursors infiltrate into a polymer template and react with the polymer moieties, resulting in growth within the 3D polymer volume and the formation of hybrid organic-inorganic materials with synergic properties. Combining SIS with self-assembled block copolymer (BCP) patterns results in selective growth of inorganic materials within the polar domains of BCP, making it attractive method for directed templating of inorganic nanostructures.
In this talk, I will discuss SIS mechanism and the principles that govern SIS growth within homopolymers and BCP. Using a combination of in-situ growth characterization, high resolution electron microscopy and quantum mechanical calculations we shed light on the diffusion-limited SIS growth and its relationship to the polymer chemistry, precursor chemistry, and SIS process conditions. We explore SIS growth in both plenary films and BCP nanoparticles and show the growth profile in nanoparticles using transmission electron microscopy tomography. The capabilities and potential of SIS in nanofabrication are demonstrated in various systems including: multi-layer isoporous Al2O3 membranes with tuned 3D pore structure, BCP-templated porous metal oxide nanoparticles, and 3D heterostructures nanorod arrays fabricated via simultaneous but spatially-controlled growth of two metal oxides.